Apparatus and method for manufacturing liquid crystal display devices, method for using the apparatus, and device produced by the method

ABSTRACT

An apparatus for manufacturing a liquid crystal display device includes a unitary vacuum processing chamber, upper and lower stages confronting each other at upper and lower spaces inside the vacuum processing chamber to bond a first and second substrates, and a first substrate lifting system formed in the lower stage for lifting the second substrate.

The present invention claims the benefit of Korean Patent ApplicationNo. P2002-9614 filed in Korea on Feb. 22, 2002, which is herebyincorporated by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a manufacturing apparatus, and moreparticularly, to an apparatus for manufacturing a liquid crystal displaysuitable for a large-sized liquid crystal display.

2. Discussion of the Related Art

In general, recent developments in the information communication fieldhave increased demand for various types of displays devices. In responseto this demand, various flat panel type displays such as liquid crystaldisplay (LCD), plasma display panel (PDP), electro-luminescent display(ELD), and vacuum fluorescent display (VFD) have been developed toreplace conventional cathode ray tube (CRT) devices. In particular, LCDdevices have been used because of their high resolution, light weight,thin profile, and low power consumption. In addition, LCD devices havebeen implemented in mobile devices such as monitors for notebookcomputers. Furthermore, LCD devices have been developed for monitors ofcomputer and television to receive and display broadcasting signals.

Accordingly, efforts to improve image quality of LCD devices contrastwith the benefits of their high resolution, light weight, thin profile,and low power consumption. In order to incorporate LCD devices as ageneral image display, image quality such as fineness, brightness,large-sized area, for example, must be realized.

A plurality of gate lines are formed along one direction at fixedintervals on the first glass substrate (TFT array substrate), and aplurality of data lines are formed along a second directionperpendicular to one direction of the plurality of gate lines, therebydefining a plurality of pixel regions. Then, a plurality of pixelelectrodes are formed in a matrix arrangement at the pixel regions, anda plurality of thin film transistors (TFT) are formed at the pixelregions. Accordingly, the plurality of thin film transistors areswitched by signals transmitted along the gate lines and transfersignals transmitted along the data lines to each pixel electrode. Inorder to prevent light leakage, black matrix films are formed on thesecond glass substrate (color filter substrate) except at regions of thesecond glass substrate that correspond to the pixel regions of the firstglass substrate.

A process for manufacturing an LCD device using a TFT substrate and acolor filter substrate will be described with reference to amanufacturing apparatus according to the related art.

The process for manufacturing an LCD device according to the related artincludes steps of forming a sealant pattern on one of a first and secondsubstrate to form an injection inlet, bonding the first and secondsubstrates to each other within a vacuum processing chamber, andinjecting liquid crystal material through the injection inlet. Inanother process of manufacturing an LCD device according to the relatedart, a liquid crystal dropping method, which is disclosed in JapanesePatent Application No. 11-089612 and 11-172903, includes steps ofdropping liquid crystal material on a first substrate, arranging asecond substrate over the first substrate, and moving the first andsecond substrates, thereby bonding the first and second substrates toeach other. Compared to the liquid crystal injection method, the liquidcrystal dropping method is advantageous in that various steps such as,formation of a liquid crystal material injection inlet, injection of theliquid crystal material, and sealing of the injection inlet areunnecessary since the liquid crystal material is predisposed on thefirst substrate.

FIGS. 1 and 2 show cross sectional views of a substrate bonding deviceusing the liquid crystal dropping method according to the related art.In FIG. 1, the substrate bonding device includes a frame 10, an upperstage 21, a lower stage 22, a sealant dispensor (not shown), a liquidcrystal material dispensor 30, a processing chamber includes an upperchamber unit 31 and a lower chamber unit 32, a chamber moving system 40,and a stage moving system 50. The chamber moving system 40 includes adriving motor driven to selectively move the lower chamber unit 32 to alocation at which the bonding process is carried out, or to a locationat which outflow of the sealant occurs and dropping of the liquidcrystal material. The stage moving system 50 includes another drivingmotor driven to selectively move the upper stage 21 along a verticaldirection perpendicular to the upper and lower stages 21 and 22.

A process of manufacturing a liquid crystal display device using thesubstrate assembly device according to the prior art follows. First, asecond substrate 52 is loaded upon the upper stage 21, and a firstsubstrate 51 is loaded upon the lower stage 22. Then, the lower chamberunit 32 having the lower stage 22 is moved to a processing location bythe chamber moving system 40 for sealant dispensing and liquid crystalmaterial dispensing. Subsequently, the lower chamber unit 32 is moved toa processing location for substrate bonding by the chamber moving system40. Thereafter, the upper and lower chamber units 31 and 32 areassembled together by the chamber moving system 40 to form a vacuumtight seal, and a pressure in the chamber is reduced by a vacuumgenerating system (not shown).

Then, the upper stage 21 is moved downwardly by the stage moving system50 at the above-mentioned vacuum state so as to closely fasten thesecond substrate 52 fixed to the upper stage 21 to the first substrate51 fixed to the lower stage 22. Further, the process for bonding therespective substrates to each other is carried out through a continuouspressurization, thereby completing the manufacture of the LCD device.

However, the substrate assembly device according to the prior art isproblematic. First, the substrate assembly device according the priorart fails to provide a subsidiary system or device for stable loading ofthe substrate at the lower stage or unloading the bonded substrates fromthe lower stage, thereby creating a high probability that damage to thesubstrate(s) may occur during the loading/unloading process.Specifically, the bonded substrates may adhere to an upper surface ofthe lower stage during the bonding process. Second, when the bondedsubstrates are unloaded, central or circumferential portions of thebonded substrates will be free of droop. Specifically, considering thatthe size of LCD devices are increasing to meet demand, preventing droopduring unloading of the bonded substrates is extremely important andnecessary.

SUMMARY OF THE INVENTION

Accordingly, the present invention is directed to an apparatus andmethod for manufacturing liquid crystal display devices, method forusing the apparatus, and device produced by the method thatsubstantially obviates one or more problems due to limitations anddisadvantages of the related art.

An object of the present invention is to provide an apparatus and methodfor manufacturing a liquid crystal display device suitable forfabrication of large-scaled LCD devices.

Additional features and advantages of the invention will be set forth inpart in the description which follows, and in part will be apparent fromthe description, or may be learned from practice of the invention. Theobjectives and other advantages of the invention will be realized andattained by the structure particularly pointed out in the writtendescription and claims hereof as well as the appended drawings.

To achieve these and other advantages and in accordance with the purposeof the present invention, as embodied and broadly described, anapparatus for manufacturing a liquid crystal display device includes aunitary vacuum processing chamber, upper and lower stages confrontingeach other at upper and lower spaces inside the vacuum processingchamber to bond a first and second substrates, and a first substratelifting system formed in the lower stage for lifting the secondsubstrate.

In another aspect, a method for manufacturing a liquid crystal displaydevice includes placing a substrate on a first substrate lifting systemby moving the first substrate lifting system along an upward direction,and placing the substrate on an upper surface of a lower stage by movingthe first substrate lifting system along a downward direction.

In another aspect, a method for manufacturing a liquid crystal displaydevice includes placing a substrate on one of a first and secondsubstrate lifting system by moving the one of the first and secondsubstrate lifting systems along an upward and direction, and placing thesubstrate on an upper surface of a lower stage by moving the one of thefirst and second substrate lifting systems along a downward direction.

In another aspect, a method for manufacturing a liquid crystal displaydevice includes placing a substrate on a first substrate lifting systemby moving the first substrate lifting system along an upward direction,moving a second substrate lifting system along the upward direction tosupport the substrate together with the second substrate lifting system,and placing the substrate on an upper surface of a lower stage by movingthe first and second substrate lifting systems along a downwarddirection.

In another aspect, a method for manufacturing a liquid crystal displaydevice includes placing a substrate on a first substrate lifting systemby moving the first substrate lifting system along an upward direction,moving a second substrate lifting system along the upward direction tosupport the substrate together with the first substrate lifting system,and placing the substrate on an upper surface of a lower stage by movingthe first and second substrate lifting systems along a downwarddirection.

In another aspect, a liquid crystal display device manufactured by amethod includes placing a substrate on one of a first and secondsubstrate lifting system by moving the one of the first and secondsubstrate lifting systems along an upward and direction, and placing thesubstrate on an upper surface of a lower stage by moving the one of thefirst and second substrate lifting systems along a downward direction.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate embodiments of the invention andtogether with the description serve to explain the principle of theinvention. In the drawings:

FIG. 1 shows a cross sectional view of a substrate bonding device priorto sealing of upper and lower chamber units according to the prior art;

FIG. 2 shows a cross sectional view of the substrate bonding deviceduring substrate bonding according to the prior art;

FIG. 3 is a cross sectional view of an exemplary apparatus including asubstrate lifting system according to the present invention;

FIG. 4 shows a schematic layout of a lower stage of an exemplarysubstrate lifting system according to the present invention;

FIG. 5A is an exploded view of a portion A in FIG. 3;

FIG. 5B shows an exemplary substrate lifting system according to thepresent invention;

FIG. 6 is a perspective view of an exemplary substrate lifting systemaccording to the present invention;

FIG. 7A shows a cross sectional view of an exemplary substrate liftingsystem according to the present invention;

FIG. 7B shows a cross sectional view of the exemplary substrate liftingsystem according to the present invention where a substrate is loadedonto a lower stage;

FIG. 8 shows a perspective view of the exemplary substrate liftingsystem shown in FIG. 7 according to the present invention; and

FIG. 9 shows a perspective view of an exemplary substrate lifting systemaccording to the present invention.

DETAILED DESCRIPTION OF THE INVENTION

Reference will now be made in detail to the preferred embodiments of thepresent invention, examples of which are illustrated in the accompanyingdrawings.

FIG. 3 is a cross sectional view of an exemplary apparatus including asubstrate lifting system according to the present invention. In FIG. 3,the apparatus may include a vacuum processing chamber 110, an upperstage 121, a lower stage 122, an upper stage moving system 131 and 133,a lower stage moving system 132 and 134, a vacuum device 200, a loaderpart 300, and a first substrate lifting system 400.

The vacuum processing chamber 110 may include an air outlet 112transferring a vacuum force to decrease a pressure at an interior of thevacuum processing chamber 110. The upper and lower stages 121 and 122may be provided at upper and lower spaces at an interior of the vacuumprocessing chamber 110, respectively. In addition, the upper and lowerstages 121 and 122 receive first and second substrates 510 and 520,which are loaded into an interior of the vacuum processing chamber 110by first and second arms 310 and 320 of the loader part 300. The firstand second substrates 510 and 520 may be affixed to the lower and upperstages 122 and 121, respectively, by an electrostatic force that isgenerated by the upper and lower stages 121 and 122. In addition, thefirst and second substrates 510 and 520 may be affixed to the lower andupper stages 122 and 121, respectively, by a vacuum force that isgenerated the upper and lower stages 121 and 122. The first and secondsubstrates 510 and 520 are maintained to be affixed to the upper andlower stages 121 and 122 during a bonding process. Accordingly, theupper and lower stages 121 and 122 enable a selective movement toperform the bonding process between the first and second substrates 510and 520.

A lower surface of the upper stage 121 may be provided an electrostaticchuck 121 a having a plurality of electrostatic plates buried thereinfor affixing the second substrate 520 to the upper stage 121. Inaddition, the upper stage 121 may include a plurality of vacuum holes121 b formed along a circumference of the electrostatic chuck 121 a Eachof the vacuum holes 121 b may be connected to a vacuum pump 123 by aplurality of pipe lines 121 c The electrostatic chuck 121 a may beconstructed with at least one pair of the electrostatic plates eachhaving opposite polarities. Alternatively, the electrostatic chuck 121 amay be constructed with at least one pair of electrostatic plates eachhaving similar polarities.

An upper surface of the lower stage 122 may be provided an electrostaticchuck 122 a having a plurality of electrostatic plates buried thereinfor affixing the first substrate 510 to the lower stage 122. Inaddition, the lower stage 122 may include a plurality of vacuum holes(122 b in FIGS. 4 and 5A) formed along a circumference of theelectrostatic chuck 122 a Like the upper stage 121, each of theplurality of vacuum holes (122 b in FIGS. 4 and 5A) may be connected toa vacuum pump (not shown) by a plurality of pipe lines (not shown). Theelectrostatic chuck 122 a may be constructed with at least one pair ofthe electrostatic plates each having opposite polarities. Alternatively,the electrostatic chuck 122 a may be constructed with at least one pairof electrostatic plates each having similar polarities.

Alternatively, an arrangement of the electrostatic chuck 122 a and theplurality of vacuum holes (122 b in FIGS. 4 and 5A) formed at the uppersurface of the lower stage 122 may not be limited to the arrangement ofthe electrostatic chuck 121 a and the plurality of vacuum holes 121 bformed at the lower surface of the upper stage 121. The electrostaticchuck 122 a and the plurality of vacuum holes (122 b in FIGS. 4 and 5A)arranged at the upper surface of the lower stage 122 may be changed toaccommodate a geometry of a target substrate and corresponding liquidcrystal dispensing areas. However, the plurality of vacuum holes (122 bin FIGS. 4 and 5A) formed at the upper surface of the lower stage 122may not be necessary.

FIG. 4 shows a schematic layout of a lower stage of an exemplarysubstrate lifting system according to the present invention. In FIG. 4,at least one a first receiving part 122 d may be formed at a firstportion of the upper surface of the lower stage 122 that corresponds toa dummy area of a first substrate (not shown) that may be placed on theupper surface of the lower stage 122. The location of the firstreceiving part 122 d may be positioned at other portions of the uppersurface of the lower stage 122 to prevent displacement of the firstsubstrate (not shown). For example, the first receiving part 122 d maybe formed at a portion corresponding to a bottom region of the dummyarea located between adjacent cell areas formed on an upper surface ofthe first substrate. Alternatively, the first receiving part 122 d mayhave a geometry corresponding to a recess or a penetrating hole formedthrough the lower stage 122. In addition, the first receiving part 122 dmay be constructed as a recessed slot having a penetrating hole formedonly at specific portions of the recessed slot.

In FIG. 3, the upper stage moving system may include an upper drivingmotor 133 axially coupled with the upper stage 121 by a moving axis 131.The lower stage moving system may include a lower driving motor 134axially coupled with the lower stage 122 by a rotational axis 132. Theupper and lower driving motors 133 and 134 may be arranged at anexterior or an interior of the vacuum processing chamber 110.

The loader part 300 may be arranged as a separate system from the vacuumprocessing chamber 110. The loader part 300 may include a first arm 310to convey a first substrate 510 upon which a liquid crystal material isdropped, and a second arm 320 to convey a second substrate 520 uponwhich a sealant is dispensed. Alternatively, although the liquid crystalmaterial may be deposited(i.e., dropped, dispensed) on the firstsubstrate 510, which may be a TFT array substrate, and the sealant maybe deposited on the second substrate 520, which may be a color filter(C/F) substrate. Moreover, both the liquid crystal material and thesealant may be deposited on the first substrate 510, which may be a TFTarray substrate, and the second substrate 520, which may be a C/Fsubstrate, may not have either of the liquid crystal material or thesealant deposited thereon. Furthermore, both the liquid crystal materialand the sealant may be deposited on the first substrate 510, which maybe a C/F substrate, and the second substrate 520, which may be a TFTarray substrate, may not have either of the liquid crystal material orthe sealant deposited thereon. The first substrate 510 may include oneof a TFT array substrate and a C/F substrate, and the second substrate520 may include another one of the TFT substrate and the C/F substrate.

In FIG. 4, the first substrate lifting system 400 may be arranged at theinterior of the vacuum processing chamber 110. Alternatively, firstsubstrate lifting system 400 may be arranged at both the exterior andinterior of the vacuum processing chamber 110. The first substratelifting system 400 may include first support parts 410 a and secondsupport parts 410 b supporting the first substrate 510, a firstelevating axis 420 connected to the first support part 410 a andextending through the first receiving part 122 d from the lower stage122, and a first driving part 430 to drive the first and second supportparts 410 a and 410 b via the first elevating axis 420. The firstsupport parts 410 a may be arranged along a first direction parallel toa loading direction of the first substrate 510, and second support parts410 b arranged along a second direction perpendicular to the loadingdirection of the first substrate 510.

An arrangement of the first substrate lifting system 400 may bedependent upon a configuration of the lower stage 122, which is alsodependent upon the configuration of the first substrate 510. Forexample, in FIG. 4, the lower stage 122 supports the first substrate 510that has a 3×3 matrix array of individual regions. Accordingly, thefirst support parts 410 a are arranged to contact each of the dummyareas of the first substrate 510 along the loading direction, and thesecond support parts 410 b are arranged to contact each of the dummyareas of the first substrate 510 along a direction perpendicular to theloading direction, thereby forming a pattern such as a “#”.

Alternatively, a first set of the first support parts 410 a may beprovided to extend along the loading direction to support the firstsubstrate 510. For example, a first set of two first support parts 410 amay contact the first substrate 510 along each of the two dummy areas ofthe first substrate 510 that extend along the loading direction, therebyforming a pattern of “=”. Moreover, a second set of second support parts410 b may be provided to extend along the second direction, which isperpendicular to the loading direction of the first substrate 510, tosupport the first substrate 510. For example, a second set of two secondsupport parts 410 b may contact the first substrate 510 along each ofthe two dummy areas of the first substrate 510 that extend along thesecond direction, thereby forming a pattern of “∥”.

The arrangement of the first substrate lifting system 400 may include asingle first support part 410 a contacting a single dummy region of thefirst substrate 510 that extends along the loading direction, and asingle second support part 410 b contacting a single dummy region of thefirst substrate 510 that extends along the second direction, therebyforming a pattern such as “”.

The arrangement of the first substrate lifting system 400 may include afirst set of three first support parts 410 a contacting three dummyregions of the first substrate 510 that extends along the loadingdirection, thereby forming a pattern of “≡”. Alternatively, thearrangement of the first substrate lifting system 400 may include asecond set of second support parts 410 b contacting three dummy regionsof the first substrate 510 that extends along the second direction,thereby forming a pattern such as “|∥”. Moreover, the arrangement of thefirst substrate lifting system 400 may include a combination of thefirst set of first support parts 410 a and the second set of secondsupport parts 410 b.

The first substrate 510 may have a configuration in which a singleindividual region is provided. Accordingly, the arrangement of the firstsubstrate lifting system 400 may include a first set of two firstsupport parts 410 a contacting dummy regions of an outermost perimeterof the first substrate 510 that extends along the loading direction, andsecond set of two second support parts 410 b contacting dummy regions ofan outermost perimeter of the first substrate 510 that extends along thesecond direction, thereby forming a pattern of “□”.

The first and second support parts 410 a and 410 b may include aplurality of protrusions (not shown) that may be formed on upperportions of the first and second support parts 41 a and 41 b to minimizea contact area between the first substrate 51 and the first and secondsupport parts 410 a and 41 b. The plurality of protrusions (or the firstand second supports 410 a and 410 b) may include polytetrafluoroethylenepolyetheretherketone, for example, to prevent damage to surface portionof the first substrate 510 that contact the plurality of protrusions,and electrically conductive materials to dissipate any staticelectricity generated on the first substrate 510.

In FIG. 4, a distance between the first support parts 410 a that arearranged along the loading direction of the first substrate 510 isdetermined to not interfere with a moving path of finger portions of thefirst arm 310. For example, the first arm 310 is formed to have threefinger portions 311 mutually separated by an interval S. Accordingly,each of the first support parts 410 a are separated by the interval S,thereby preventing interference with motion of the first arm 310.

FIG. 5B shows an exemplary substrate lifting system according to thepresent invention. In FIG. 5B, central portions of the second supportparts 410 b that are provided along the second direction are offsetalong a downward direction to prevent the interference with the fingerportions 311 of the first arm 310. In addition, side portions of thesecond support parts 410 b that contact the first elevating axis 420 areformed having a length so as to not contact outermost finger portions311 of the first arm 310.

FIG. 6 is a perspective view of an exemplary substrate lifting systemaccording to the present invention. In FIG. 6, at least two of the firstelevating axis 420 axially coupled with the first substrate liftingsystem 400 and the first driving part 430 may be provided at each of thefirst and second support parts 410 a and 410 b. For example, each of thefirst elevating axis 420 may be connected to corresponding first drivingarts 430 that are provided at a crossing portion between the first andsecond support parts 410 a and 410 b. Alternatively, a single firstdriving part 430 may be used to drive the first and second support parts410 a and 410 b. Moreover, instead of using the plurality of protrusions(not shown), faces of the first and second support parts 410 a and 410 bthat contact the surface portions of the first substrate 510 may becoated with materials such as polytetrafluoroethylene orpolyetheretherketone, for example, to prevent damage caused by thecontact between the first and second support parts 410 a and 410 b andthe first substrate 510, and electrically conductive materials todissipate any static electricity generated on the first substrate 510.The first and second support parts 410 a and 410 b may have variouscross sectional geometries including square, round, a polygonal, forexample. Furthermore, the first and second support parts 410 a and 410 bmay be of a solid material or of a hollow material.

In FIG. 3, the first driving part 430 of the first substrate liftingsystem 400 may include at least a step motor and a cylinder. The stepmotor may move the cylinder vertically along the direction of the firstelevating axis 420 using a pneumatic or hydraulic system. The firstdriving part 430 may be fixed to a lower space at the interior of thevacuum processing chamber 110, the first driving part 430 may penetratea bottom of the vacuum processing chamber 110 to be fixed at a locationat the exterior of the vacuum processing chamber 110. Thus, interferencebetween the various driving parts may be avoided, and may provide easyinstallation of each of the driving parts.

A process of loading/unloading substrates using the apparatus accordingto the present invention is explained schematically with respect toFIGS. 3, 7A, and 7B.

Then, the loader part 300 controls the second arm 320 to load the secondsubstrate 520, which may include the sealant, onto the lower surface ofthe upper stage 121, and controls the first arm 310 to load the firstsubstrate 510, which has at least the liquid crystal material, onto theupper surface of the lower stage 122.

A substrate loading process includes applying a vacuum force to theplurality of vacuum holes 121 b of the upper stage 121. During thesubstrate loading process, the vacuum pump 123, which is connected tothe upper stage 121, produces the vacuum force to the upper stage 121,thereby transferring the second substrate 520 from the second arm 320and affixing the second substrate 520 to the lower surface of the upperstage 121. The loader part 300 controls the first arm 310 so that thefirst substrate 510 upon which the liquid crystal material is dropped isloaded onto the upper surface of the lower stage 122.

In FIG. 7A, after the substrate loading process, a substrate elevatingprocess includes enabling the first substrate system 400 to move thefirst elevating axes 420 along an upward direction. The first and secondsupport parts 410 a and 410 b that are connected to the first elevatingaxes 420 begin to travel in the upward direction from the firstreceiving part 122 d formed at the upper surface of the lower stage 122,as shown in FIG. 8. Accordingly, the first and second support parts 410a and 410 b contact a bottom surface of the first substrate 510positioned on the first arm 310. The first elevating axes 420 togetherwith the first and second support parts 410 a and 410 b continue totravel in the upward direction until the first substrate 510 is removedfrom the first arm 310. Then, the first elevating axes 420 stops theupward direction travel after elevation of a predetermined height.

When the first substrate 510 contacts the upper surfaces of the firstand second support parts 410 a and 420 b, a weight of the firstsubstrate 510 maybe distributed and internal stress of the firstsubstrate 510 may be alleviated. Thus, the first substrate 510 is fullysupported and any displacement or droop of the first substrate 510 isavoided. Accordingly, the contacts between the first substrate 510 andthe upper surfaces of the first and second support parts 410 a and 410 bmay include one of face contacts, line contacts, and point contacts.Alternatively, the contacts between the first substrate 510 and theupper surfaces of the first and second support parts 410 a and 410 b mayinclude a combination of face contacts, line contacts, and pointcontacts.

The first and second support parts 410 a and 410 b may be coated withmaterial such as polytetrafluoroethylene or polyetheretherketone, forexample, to prevent damage to the bottom surface of the first substrate510 and an electrically conducting material to discharge any staticelectricity generated on the first substrate 510.

In FIG. 7B, after the substrate elevating process, an extraction processincludes extracting the first arm 310 out of the vacuum processingchamber 110 by control of the loader part 300, and a withdrawal processincludes enabling the first driving parts 430 to withdrawal the firstelevating axes 420 in a downward direction to be placed into the firstreceiving part 122 d of the lower stage 122. Accordingly, the bottomsurface of the first substrate 510 contact the upper surface of thelower stage 122.

After the extraction process and the withdrawal process, a substratetransfer process includes enabling the vacuum pump (not shown) that isconnected to the lower stage 122 to transfer a vacuum force to theplurality of vacuum holes (122 b in FIG. 5B). Accordingly, the bottomsurface of the first substrate 510 is affixed to the upper surface ofthe lower stage 122 by the vacuum force generated by the vacuum pump(not shown). Alternatively, the substrate transfer process may includeapplying a potential to the electrostatic plates of the electrostaticchuck 122 a of the lower stage 122, thereby affixing the bottom surfaceof the first substrate 510 to the upper surface of the lower stage 122.

After the substrate transfer process, a vacuum processing chamberprocess includes enabling the vacuum device 200 to reduce a pressure ofthe interior of the vacuum processing chamber 110. Then, once a desiredvacuum pressure is attained, a bonding process of the first and secondsubstrates 510 and 520 is performed by enabling the upper drive motor133 to move the upper stage 121 in the downward direction, or byenabling the lower drive motor 134 to move the lower stage 122 in theupward direction. Alternatively, both the upper and lower drive motors133 and 134 may be enabled, thereby moving the upper and lower stages121 and 122 in the downward and upward direction, respectively.

Alternatively, an alignment process may be performed prior to thebonding process. The alignment process may include a certificationprocedure that the upper and lower substrates 510 and 520 are alignedwith each other, and may include optical and computer systems. If thefirst and second substrate 510 and 520 are not certified as beingaligned, adjustment systems may be enabled to move the upper stage 121along an X-Y plane, and rotate the rotational axis 132 of the lowerstage 122. Alternatively, both the upper and lower stages 121 and 122may be moved along an X-Y plane in addition to the rotation of the lowerstage 122.

Once the first and second substrates 510 and 520 have been bonded, adetachment process and an unloading process may be performed, whereinone of the first arm 310 and the second arm 320, may unload the bondedfirst and second substrates 510 and 520 now residing upon the uppersurface of the lower stage 122.

The detaching process includes removing the vacuum force from theplurality of vacuum holes (122 b in FIG. 5A), or removing the potentialfrom the electrostatic plates of the electrostatic chuck 122 a The lowerstage unloading process may include driving the first substrate liftingsystem 400 using the driving parts 430 to move the first elevating axes420 and the first and second support parts 410 a and 410 b in the upwarddirection. Accordingly, the bonded substrates are removed from the uppersurface of the lower stage 122, and the driving parts 430 continue tomove the first elevating axes 420 and the first and second support parts410 a and 410 b until the bonded substrates are elevated above the uppersurface of the lower stage 122 by a predetermined amount. As previouslydescribed, the driving parts 430 may be replaced by a single drivingpart (not shown).

Once the detaching and lower stage unloading processes have beencompleted, a bonded substrate unloading process includes the loader part300 controlling one of the first arm 310 and the second arm 320 to placethe second substrate 520 into the interior of the vacuum processingchamber 110. Then, a loading position of the second arm 320 is arrangedunder the bonded substrates that have been previously moved along theupward direction by the first substrate lifting system 400. Accordingly,the first driving parts 430 of the first substrate lifting system 400are driven to move the first elevation axes 420 and the first and secondsupport parts 410 a and 410 b along a downward direction. Thus, thebonded substrates that were placed on the first and second support parts410 a and 410 b are now placed on the second arm 320, and the first andsecond support parts 410 a and 410 b continue to move along the downwarddirection to be received into the first receiving part 122 d of thelower stage 122.

Once the bonded substrates unloading process has been completed, abonded substrates extraction process includes the second arm 320 beingwithdrawn from the interior of the vacuum processing chamber 110 bycontrol of the loader part 300. After completion of the bondedsubstrates unloading process, the loading process of the first substrate510 by the first arm 310 and first substrate lifting system 400 maybegin, as described above.

FIG. 9 shows a perspective view of an exemplary substrate lifting systemaccording to the present invention. In FIG. 9, at least one a secondreceiving part 122 e may be formed at opposing edge portions along anupper circumference of the lower stage 122 in a direction perpendicularto the loading/unloading direction of the first substrate 510. Thesecond receiving parts 122 e may be formed of a concave recess or apenetrating form. In addition, a second substrate lifting system 600 maybe received by the second receiving parts 122 e to supportcircumferential edge portions of the first substrate 510 during thesubstrate loading process or support circumferential edge portions ofthe bonded substrates during the bonded substrates unloading process.Accordingly, the displacement or droop of the first substrate or bondedsubstrate is further prevented.

The second substrate lifting system 600 may be received inside thesecond receiving part 122 e while being positioned initially at bothsides of the lower stage 122. In addition, the second substrate liftingsystem may include at least second support part 610 that supports acorresponding bottom edge portion of the first substrate 510, a secondelevating axis 620 built into one body of the second support part 610 tomove the second support part 610 along the vertical direction, and asecond driving part 630 connected to the second elevating axis 620 tomove the second elevating axis 620 along the vertical direction.Accordingly, the second receiving part 122 e may be formed have apredetermined length along a portion corresponding to the dummy area ofthe first substrate 510 when placed along the correspondingcircumferential upper edge portions of the lower stage 122. Furthermore,the second support part 610 may be formed to have a length correspondingto a shape of the second receiving part 122 e to support a circumferenceof the first substrate 510. Specifically, the second support part 610may be formed having a bent shape along a first face to provide supportto the bottom of the first substrate 510 and a second face supporting aside of the first substrate 510. In addition, a previously describedabove, a face contacting the first substrate 510 may be coated with acoating material to prevent the substrate damage caused by the contactbetween the second support part 610 and the first substrate 510. Thecoating material may be the same as the first and second support parts410 a and 410 b, polytetrafluoroethylene or polyetheretherketone, forexample, and an electrically conductive material to discharge any staticelectricity generated on the first substrate 510.

The second elevating axis 620 and second driving part 630 may be formedto have the first elevating axis 420 and the first driving part 430.Moreover, the second support part 610 may include a single body formedto engage an entire circumference of the lower stage 122. The pluralityof the second support parts 610 may be provided and separated from eachby a predetermined interval, wherein the interval is sufficient toprevent the first substrate from exceeding a minimum displacement ordroop limit. Accordingly, ends of the second support parts 610 mayinclude a single body with at least one second elevating axis 620 andsecond driving part 630 being are provided at the ends of the secondsupport parts 610, thereby enabling a smooth operation of the respectivesecond support parts 610.

An operational sequence of the second substrate lifting system 600 willnow be explained with respect to the first substrate lifting system 400.The second driving part 630 of the second substrate lifting system 600operates simultaneously in connection with the operation of the firstdriving part 430 of the first substrate lifting system 400, therebymoving the second elevating axis 620 and second support part 610 alongthe vertical direction. The simultaneous operation of the second drivingpart 630 and the first driving part 430 enables support of thecircumferential portions of the first substrate 510, as well as thebonded substrates when the first substrate 510 and the bonded substratesare loaded and unloaded, respectively.

An exemplary method of loading the first substrate 510 by thesimultaneous operation of the first and second substrate lifting systems400 and 600 are described as follows. First, the first lifting system400 is enabled to carry out the loading process of the first substrate510, much like the above described process. Sequentially, the upwardmovement of the first substrate lifting system 400 is performed, thefirst substrate 510 to be loaded onto the upper surface of the lowerstage 122 is placed on the first substrate lifting system 400, and thefirst substrate lifting system 400 moves downward to place the firstsubstrate 510 on the upper surface of the lower stage 122.

Second, the first and second substrate lifting system 400 and 600 aresimultaneously moved in the upward direction, the first substrate 510 tobe loaded onto the upper surface of the lower stage 122 is placed on thefirst and second substrate lifting systems 400 and 600, and the downwardmovements of the first and second substrate lifting systems 400 and 600are simultaneously moved in the downward direction to place the firstsubstrate 510 on the upper surface of the lower stage 122. The processof loading the first substrate 510 may be performed while the centraland circumferential portions of the first substrate 510 aresimultaneously supported, thereby preventing the displacement or droopof the first substrate 510.

Third, the second substrate lifting system 600 is moved along the upwarddirection, the first substrate 510 to be loaded onto the upper surfaceof the lower stage 122 is placed on the second substrate lifting system600, the first substrate lifting system 400 continues moving along theupward direction to support the first substrate 510 on the secondsubstrate lifting system 600, and the downward direction movement of thefirst and second substrate lifting system 400 and 600 are preformed toplace the first substrate 510 on the upper surface of the lower stage122. Accordingly, after supporting the first substrate 510 by the secondsubstrate lifting system 600 and before the unloading process of thefirst arm 310, the first substrate lifting system 400 moves along theupward direction to support the first substrate 510 together with thesecond lifting system 600. In addition, after the first substrate 510 isunloaded by the first arm 310 and supported by the second substratelifting system 600, the first substrate support system 400 moves alongthe upward direction to support the first substrate 510 together withthe second substrate lifting system 600. The process preventsinterference between the first and second support parts 410 a and 410 band the first arm 310 during the loading process of the first substrate510, as well as avoiding the bending portions of the first support parts410 a and 410 b.

Fourth, movement along the upward direction of the first substratelifting system 400 is performed, the first substrate 510 to be loadedonto the upper surface of the lower stage 122 is placed on the first andsecond substrate lifting systems 400 and 600 moves along the upwarddirection to support the first substrate 510 together with the firstsubstrate lifting system 400, the first and second substrate liftingsystem 400 and 600 are simultaneously moved along the downward directionto place the first substrate 510 onto the upper surface of the lowerstage 122.

The above process of loading the first substrate 510 using the first andsecond substrate lifting system 400 and 600 according to the presentinvention may not be limited to the above-mentioned description, but canbe achieved various methods as well. Accordingly, the substrate liftingsystem of the apparatus according to the present invention has thefollowing advantages and effects.

It will be apparent to those skilled in the art that variousmodifications and variations can be made in the apparatus and method formanufacturing liquid crystal display devices, method for using theapparatus, and device produced by the method of the present inventionwithout departing from the spirit or scope of the invention. Thus, it isintended that the present invention covers the modifications andvariations of this invention provided they come within the scope of theappended claims and their equivalents.

What is claimed is:
 1. An apparatus for manufacturing a liquid crystaldisplay device, comprising: a unitary vacuum processing chamber; upperand lower stages confronting each other at upper and lower spaces insidethe vacuum processing chamber to bond a first and second substrates; afirst substrate lifting system formed in the lower stage for lifting thesecond substrate.
 2. The apparatus according to claim 1, wherein thefirst substrate lifting system comprising: a first support part tosupport the substrate; and a first receiving part to receive the firstsupport part formed in the lower stage.
 3. The apparatus according toclaim 2, wherein the at least one first receiving part is formed along alongest side of the lower stage, and the first support part is alignedwith the first receiving part.
 4. The apparatus according to claim 2,wherein the at least one first receiving part is formed along a shortestside of the lower stage, and the first support part is aligned to thefirst receiving part.
 5. The apparatus according to claim 2, wherein theat least one first receiving part is formed along longest and shortestsides of the lower stage, and the first support part is aligned with thefirst receiving part.
 6. The apparatus according to claim 2, furthercomprising: a first elevating axis provided in the first support partand penetrating the first receiving part from a bottom portion of thelower stage to move the first support part along the up and downdirection; and a first driving part connected to the first elevatingaxis to operate the first elevating axis to move along the up and downdirection.
 7. The apparatus according to claim 6, wherein the firstelevating axis is coupled with the first support part and the firstdriving part that moves the first elevating axis are formed at eachsupport part to confront each other at a length of the first supportpart formed to have a displacement between a central portion and bothends of the first support part to reach a predetermined height.
 8. Theapparatus according to claim 2, wherein the first support part is shapedlike one of bar, round pin, and a polygonal hollow pipe.
 9. Theapparatus according to claim 2, further comprising: at least one firstreceiving part at an upper surface of the lower stage, the firstreceiving part having one of a concave recess and a penetrating part.10. The apparatus according to claim 2, further comprising: at least onesecond receiving part arranged at circumferential edges of the lowerstage perpendicular to a loading/unloading direction of the substrate tohave one of a concave recess and a penetrating part.
 11. The apparatusaccording to claim 10, wherein the second receiving part is formed tohave a predetermined length at the circumferential edges of the lowerstage corresponding to a portion of the substrate and the second supportpart is formed to have a length aligned with the second receiving partto lift the substrate.
 12. The apparatus according to claim 1, furthercomprising: a second substrate lifting system, one end of the secondsubstrate lifting system received inside the second receiving part tomove along the upward direction to a predetermined height from thecircumferential edges of the lower stage, and an other end of the secondsubstrate lifting system to move along the upward and downwarddirections.
 13. The apparatus according to claim 12, wherein the secondsubstrate lifting system includes at least one second support partreceived inside a second receiving part and positioned initially at bothsides of the lower stage to support both side bottoms of the substrate.14. The apparatus according to claim 13, further comprising: a secondelevating axis to move the second support part along the upward anddownward directions, and a second driving part connected to the secondelevating axis to operate the second elevating axis along the upward anddownward direction.
 15. The apparatus according to claim 14, wherein oneend of the second support parts and at least one of the second elevatingaxis is provided between the second support parts.
 16. The apparatusaccording to claim 13, wherein at least faces of the first and secondsupport parts to be contacted with the substrate are coated with acoating material to prevent damage of the substrate caused by contactwith the substrate.
 17. The apparatus according to claim 16, wherein thecoating material includes at least one of polytetrafluoroethylene,polyetheretherketone, and electro-conductive materials.
 18. Theapparatus according to claim 13, wherein the second receiving part isformed to have a predetermined length at the circumferential edges ofthe lower stage corresponding to a portion of the substrate and thesecond support part is formed to have a length aligned with the secondreceiving part to lift the substrate.
 19. The apparatus according toclaim 18, wherein the second support is bent to have a face supporting abottom of the substrate and another face supporting a side of thesubstrate.
 20. The apparatus according to claim 13, wherein the secondsupport parts contact the first substrate in at least one of a facecontact, a line contact, and a point contact.
 21. The apparatusaccording to claim 1, further comprising: a loader part driven to loadand unload the substrates into and out of the vacuum processing chamber.22. A method for manufacturing a liquid crystal display device,comprising the steps of: placing a substrate on a first substratelifting system by moving the first substrate lifting system along anupward direction; and placing the substrate on an upper surface of alower stage by moving the first substrate lifting system along adownward direction.
 23. The method according to claim 22, wherein acontact portion between the first substrate lifting system and thesubstrate is within a dummy area between cell areas of the substratewhen the substrate is placed on the first substrate lifting system. 24.The method according to claim 22, further comprising the step of: movinga second substrate lifting system along the upward direction to supportthe substrate together with the first substrate lifting system, whereinthe substrate is placed on an upper surface of a lower stage by movingthe first and second substrate lifting systems along a downwarddirection.
 25. The method according to claim 24, wherein a contactportion between the first and second substrate lifting system and thesubstrate is within a dummy area between cell areas of the substratewhen the substrate is placed upon one of the first and second liftingsystem.
 26. A method for manufacturing a liquid crystal display device,comprising the steps of: placing a substrate on one of a first andsecond substrate lifting system by moving the one of the first andsecond substrate lifting systems along an upward and direction; andplacing the substrate on an upper surface of a lower stage by moving theone of the first and second substrate lifting systems along a downwarddirection.
 27. The method according to claim 26, wherein a contactportion between the first and second substrate lifting systems and thesubstrate within a dummy area between cell areas of the substrate whenthe substrate is placed upon one of the first and second liftingsystems.
 28. A method for manufacturing a liquid crystal display device,comprising the steps of: placing a substrate on a first substratelifting system by moving the first substrate lifting system along anupward direction; moving a second substrate lifting system along theupward direction to support the substrate together with the firstsubstrate lifting system; and placing the substrate on an upper surfaceof a lower stage by moving the first and second substrate liftingsystems along a downward direction.
 29. The method according to claim28, wherein a contact portion between the first and second substratelifting systems and the substrate is within a dummy area between cellareas of the substrate when the substrate is placed up one of the firstand second lifting systems.